Novel periodic microstructures fabricated by multi-exposure two-beam interference lithography

Yinbing Bai, Aping Zhang

Research output: Chapter in book / Conference proceedingConference article published in proceeding or bookAcademic researchpeer-review

1 Citation (Scopus)

Abstract

Some novel periodic structures with different internal nanopatterns are numerically and experimentally demonstrated based on multi-exposure two-beam interference lithography. Two-dimensional quasi-crystal structures were fabricated with precisely controlled exposure directions and doses. The experiment results show such a fabrication technology is very promising for making diverse large-area submicron structures.
Original languageEnglish
Title of host publication2010 Asia Communications and Photonics Conference and Exhibition, ACP 2010
Pages469-470
Number of pages2
DOIs
Publication statusPublished - 1 Dec 2010
Externally publishedYes
EventAsia Communications and Photonics Conference and Exhibition, ACP 2010 - Shanghai, China
Duration: 8 Dec 201012 Dec 2010

Conference

ConferenceAsia Communications and Photonics Conference and Exhibition, ACP 2010
CountryChina
CityShanghai
Period8/12/1012/12/10

ASJC Scopus subject areas

  • Surfaces, Coatings and Films

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