Novel periodic microstructures fabricated by multi-exposure two-beam interference lithography

Yinbing Bai; Aping Zhang

doi:10.1109/ACP.2010.5682582

Novel periodic microstructures fabricated by multi-exposure two-beam interference lithography

Research output: Chapter in book / Conference proceeding › Conference article published in proceeding or book › Academic research › peer-review

1 Citation (Scopus)

Abstract

Some novel periodic structures with different internal nanopatterns are numerically and experimentally demonstrated based on multi-exposure two-beam interference lithography. Two-dimensional quasi-crystal structures were fabricated with precisely controlled exposure directions and doses. The experiment results show such a fabrication technology is very promising for making diverse large-area submicron structures.

Original language	English
Title of host publication	2010 Asia Communications and Photonics Conference and Exhibition, ACP 2010
Pages	469-470
Number of pages	2
DOIs	https://doi.org/10.1109/ACP.2010.5682582
Publication status	Published - 1 Dec 2010
Externally published	Yes
Event	Asia Communications and Photonics Conference and Exhibition, ACP 2010 - Shanghai, China Duration: 8 Dec 2010 → 12 Dec 2010

Conference

Conference	Asia Communications and Photonics Conference and Exhibition, ACP 2010
Country/Territory	China
City	Shanghai
Period	8/12/10 → 12/12/10

ASJC Scopus subject areas

Surfaces, Coatings and Films

More information

10.1109/ACP.2010.5682582

Cite this

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title = "Novel periodic microstructures fabricated by multi-exposure two-beam interference lithography",

abstract = "Some novel periodic structures with different internal nanopatterns are numerically and experimentally demonstrated based on multi-exposure two-beam interference lithography. Two-dimensional quasi-crystal structures were fabricated with precisely controlled exposure directions and doses. The experiment results show such a fabrication technology is very promising for making diverse large-area submicron structures.",

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Novel periodic microstructures fabricated by multi-exposure two-beam interference lithography. / Bai, Yinbing; Zhang, Aping.

2010 Asia Communications and Photonics Conference and Exhibition, ACP 2010. 2010. p. 469-470 5682582.

Research output: Chapter in book / Conference proceeding › Conference article published in proceeding or book › Academic research › peer-review

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AU - Zhang, Aping

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N2 - Some novel periodic structures with different internal nanopatterns are numerically and experimentally demonstrated based on multi-exposure two-beam interference lithography. Two-dimensional quasi-crystal structures were fabricated with precisely controlled exposure directions and doses. The experiment results show such a fabrication technology is very promising for making diverse large-area submicron structures.

AB - Some novel periodic structures with different internal nanopatterns are numerically and experimentally demonstrated based on multi-exposure two-beam interference lithography. Two-dimensional quasi-crystal structures were fabricated with precisely controlled exposure directions and doses. The experiment results show such a fabrication technology is very promising for making diverse large-area submicron structures.

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U2 - 10.1109/ACP.2010.5682582

DO - 10.1109/ACP.2010.5682582

M3 - Conference article published in proceeding or book

SN - 9781424471119

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BT - 2010 Asia Communications and Photonics Conference and Exhibition, ACP 2010

T2 - Asia Communications and Photonics Conference and Exhibition, ACP 2010

Y2 - 8 December 2010 through 12 December 2010

ER -

Novel periodic microstructures fabricated by multi-exposure two-beam interference lithography

Abstract

Conference

ASJC Scopus subject areas

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