Abstract
Some novel periodic structures with different internal nanopatterns are numerically and experimentally demonstrated based on multi-exposure two-beam interference lithography. Two-dimensional quasi-crystal structures were fabricated with precisely controlled exposure directions and doses. The experiment results show such a fabrication technology is very promising for making diverse large-area submicron structures.
Original language | English |
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Title of host publication | 2010 Asia Communications and Photonics Conference and Exhibition, ACP 2010 |
Pages | 469-470 |
Number of pages | 2 |
DOIs | |
Publication status | Published - 1 Dec 2010 |
Externally published | Yes |
Event | Asia Communications and Photonics Conference and Exhibition, ACP 2010 - Shanghai, China Duration: 8 Dec 2010 → 12 Dec 2010 |
Conference
Conference | Asia Communications and Photonics Conference and Exhibition, ACP 2010 |
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Country/Territory | China |
City | Shanghai |
Period | 8/12/10 → 12/12/10 |
ASJC Scopus subject areas
- Surfaces, Coatings and Films