Novel periodic microstructures fabricated by multi-exposure two-beam interference lithography

Yinbing Bai, Aping Zhang

Research output: Chapter in book / Conference proceedingConference article published in proceeding or bookAcademic researchpeer-review

Abstract

We present some novel periodic structures with different internal nanopatterns based on multi-exposure two-beam interference lithography. Two-dimensional quasi-crystal structures are fabricated with precisely control of exposure directions and doses as well as the total number of exposures. Experimental fabrication of microstructures are demonstrated and comparied with numerical simulations of intensity distributions. The size of the fabricated samples is around 1 square centimeter. The diffraction spectra of the fabricated samples are measured and tested. The experiment results show such a fabrication technology is very promising for making diverse large-area microstructures with complex internal nanopatterns.
Original languageEnglish
Title of host publicationAsia Communications and Photonics Conference and Exhibition, ACP 2010
PublisherOptical Society of America (OSA)
ISBN (Print)9780819485540
Publication statusPublished - 1 Jan 2010
Externally publishedYes
EventAsia Communications and Photonics Conference and Exhibition, ACP 2010 - Shanghai, China
Duration: 8 Dec 201012 Dec 2010

Conference

ConferenceAsia Communications and Photonics Conference and Exhibition, ACP 2010
CountryChina
CityShanghai
Period8/12/1012/12/10

Keywords

  • Lithography
  • Micro-optical devices
  • Microstructure fabrication
  • Optical design and fabrication

ASJC Scopus subject areas

  • Instrumentation
  • Atomic and Molecular Physics, and Optics

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