Abstract
We present some novel periodic structures with different internal nanopatterns based on multi-exposure two-beam interference lithography. Two-dimensional quasi-crystal structures are fabricated with precisely control of exposure directions and doses as well as the total number of exposures. Experimental fabrication of microstructures are demonstrated and comparied with numerical simulations of intensity distributions. The size of the fabricated samples is around 1 square centimeter. The diffraction spectra of the fabricated samples are measured and tested. The experiment results show such a fabrication technology is very promising for making diverse large-area microstructures with complex internal nanopatterns.
| Original language | English |
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| Title of host publication | Asia Communications and Photonics Conference and Exhibition, ACP 2010 |
| Publisher | Optical Society of America (OSA) |
| ISBN (Print) | 9780819485540 |
| Publication status | Published - 1 Jan 2010 |
| Externally published | Yes |
| Event | Asia Communications and Photonics Conference and Exhibition, ACP 2010 - Shanghai, China Duration: 8 Dec 2010 → 12 Dec 2010 |
Conference
| Conference | Asia Communications and Photonics Conference and Exhibition, ACP 2010 |
|---|---|
| Country/Territory | China |
| City | Shanghai |
| Period | 8/12/10 → 12/12/10 |
Keywords
- Lithography
- Micro-optical devices
- Microstructure fabrication
- Optical design and fabrication
ASJC Scopus subject areas
- Instrumentation
- Atomic and Molecular Physics, and Optics