None-touched near-field optical nanolithography

S. C. Chen, T. M. Chang, K. P. Chiu, D. P. Tsai

Research output: Chapter in book / Conference proceedingConference article published in proceeding or bookAcademic researchpeer-review

1 Citation (Scopus)

Abstract

Silver nanorods have an excellent effect on the transmitted wave localizing, especially, the intensity of the transmitted wave is strong enough below the bottom of the nanorods. Based on this property, we offer a non-touched optical nanolithographic imaging method, and the structure of the mask is made by silver nanorods which are embedded in a silica block. We numerically prove the availability of the nanolithography in visible domain, and a high resolution of nanolithographic image can be built by a multi-exposures process.

Original languageEnglish
Title of host publication2006 International Conference on Numerical Simulation of Semiconductor Optoelectronic Devices, NUSOD '06
Pages83-84
Number of pages2
DOIs
Publication statusPublished - Sep 2006
Externally publishedYes
Event2006 International Conference on Numerical Simulation of Semiconductor Optoelectronic Devices, NUSOD '06 - Nanyang, Singapore
Duration: 11 Sep 200614 Sep 2006

Publication series

Name2006 International Conference on Numerical Simulation of Semiconductor Optoelectronic Devices, NUSOD '06

Conference

Conference2006 International Conference on Numerical Simulation of Semiconductor Optoelectronic Devices, NUSOD '06
CountrySingapore
CityNanyang
Period11/09/0614/09/06

ASJC Scopus subject areas

  • Computer Science Applications
  • Electrical and Electronic Engineering

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