Nickel(II) complexes of N -(dialkylcarbamothioyl)-4-nitrobenzamide as single-source precursors for the deposition of nanostructured nickel sulfide thin films by chemical vapor deposition

Nickel(II) complexes of N-(di-alkyl-carbamothioyl)-4-nitrobenzamide (alkyl = ethyl or n-propyl) have been synthesized and characterized by infrared spectroscopy, elemental analysis, nuclear magnetic resonance spectroscopy, and mass spectrometry. The structures of bis[N-(diethylcarbamothioyl)-4- nitrobenzamide]nickel(II) (2a) and bis[N-(dipropylcarbamothioyl)-4- nitrobenzamide]nickel(II) (2b) have been determined by X-ray crystallography. FTIR and NMR of the nickel complexes showed the absence of the N-H proton resonance and the N-H stretch and shift of ν C=O and ν C=S as expected. Both complexes have been used as single-source precursors for the deposition of nickel sulfide nanostructured thin films by aerosol-assisted chemical vapor deposition. The nanostructured thin films were characterized by X-ray powder diffraction, scanning electron microscopy, energy dispersive X-ray analysis, and atomic force microscopy.