Ni antidot structure via single-step anodization of Al/Ni films

Sheung Mei Ng, Wang Cheung Wong, Xu Fang, Hui Ye, Chi Wah Leung

Research output: Journal article publicationJournal articleAcademic researchpeer-review

Abstract

Antidot nanostructures were fabricated on Ni films by a single-step anodization process of magnetron-sputtered Al/Ni/W trilayers. Coercivity and saturation magnetization of the Ni layer were tuned by controlling the anodization time. Transmission electron microscopy was used to investigate the mechanism of the antidot formation process. The present study provides a simple and direct route for the fabrication of magnetic antidot nanostructures for device applications.

Original languageEnglish
Pages (from-to)73-78
Number of pages6
JournalSolid-State Electronics
Volume138
DOIs
Publication statusPublished - 1 Dec 2017

Keywords

  • Anodization
  • Antidot structure

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Materials Chemistry

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