Abstract
We report the use of photothermal radiometric microscopy to image through silicon wafers. Experimental results are presented which show that the signal obtained decreases as the normal emissivity of the material on the back surface increases. The theory for the emissivity of partially transparent objects has been extended to explain these findings. We conclude that the contrast is due to photon-induced switching of the infra-red transmission coefficient of the silicon.
Original language | English |
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Pages (from-to) | 1134-1136 |
Number of pages | 3 |
Journal | Electronics Letters |
Volume | 23 |
Issue number | 21 |
DOIs | |
Publication status | Published - 1 Jan 1987 |
Externally published | Yes |
Keywords
- Microscopy
- Semiconductor devices and materials
- Silicon
ASJC Scopus subject areas
- Electrical and Electronic Engineering