Multimode optical characterization based on multiwave lateral shearing interferometry

Optical characterization technology has developed as an important means to ensure the optical performance of functional devices and the reliability of complex systems, playing a key role in precision manufacturing, semiconductors, and medical optics. Comprehensive performance verification of optical devices requires the measurement of multidimensional parameters, including 3D topography and optical characteristics. However, current commercial optical characterization instruments are designed for single parameters in specific fields, and there is a lack of a universal measurement solution that enables a single system to adapt to multiple scenarios. To address the above issue, this paper develops a novel multimode optical characterization measurement system. Without reference light, it achieves wavefront measurement via single interference pattern acquisition and establishes the mapping relationship between wavefront features and key device parameters. With a modular optical path design, it supports flexible switching of measurement modes for multiscenario testing. Experiments show it enables large-aperture measurement and diopter analysis for optometric products, rapid phase characterization for small-feature meta-surfaces, and nanoscale roughness and flatness testing for high-reflectivity wafers. This integrated system improves the efficiency of measuring optical performance and provides a universal solution for optical characterization across fields.