Morphology and growth of electrodeposited cuprous oxide under different values of direct current density

F. Hu, Kang Cheung Chan, Tai Man Yue

Research output: Journal article publicationJournal articleAcademic researchpeer-review

10 Citations (Scopus)

Abstract

The growth of Cu2O thin films electrodeposited by a two-electrode system with acid and alkaline electrolytes under different values of direct current (DC) densities was investigated. The microstructure of Cu2O thin films produced in the acid electrolyte changes from a ring shape to a cubic shape with increasing DC density, and the microstructure of Cu2O thin films produced in the alkaline electrolyte has a typical pyramid shape. The X-ray diffraction results show that Cu2O thin films can be electrodeposited over a larger current domain than those deposited by a three-electrode system. The growth of Cu2O thin films is examined under this domain, and the electrocrystallization process of such films is discussed taking into consideration the effect of current density on nucleation, cluster growth, and crystal growth.
Original languageEnglish
Pages (from-to)120-125
Number of pages6
JournalThin Solid Films
Volume518
Issue number1
DOIs
Publication statusPublished - 2 Nov 2009

Keywords

  • Cuprous oxide
  • Direct current electrodeposition
  • Morphology
  • Scanning electron microscopy
  • X-ray diffraction

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Metals and Alloys
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

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