Microstructure and mechanical properties of B₄C films deposited by ion beam sputtering

Keyphrases

• Mechanical Properties 100%
• Microstructure 100%
• Microstructure Properties 100%
• Ion Beam Sputtering 100%
• B4C Film 100%
• Chemical Composition 50%
• X-ray Photoelectron Spectroscopy 50%
• Profilers 50%
• Transmission Electron Microscopy 50%
• Radial Distribution Function 50%
• Internal Stress 50%
• Silicon Substrate 50%
• Nanoindentation Hardness 50%
• Deposition Temperature 50%
• Electron Diffraction Pattern 50%
• Short-range Order 50%
• Stoney Equation 50%
• Transmission Electron Diffraction 50%
• Boron Carbide Film 50%
• Different Substrate Temperature 50%
• Nanoindentor 50%

Engineering

• Deposited Film 100%
• Experimental Result 50%
• Silicon Substrate 50%
• Substrate Temperature 50%
• Ray Photoelectron Spectroscopy 50%
• Deposition Temperature 50%
• Internal Stress 50%
• Stoney Equation 50%
• Range Order 50%
• Thin Films 50%
• Radial Distribution 50%
• Electron Diffraction 50%

Material Science

• Film 100%
• Boron 14%
• Nanoindentation 14%
• Electron Diffraction 14%
• Carbide 14%
• Diffraction Pattern 14%
• Short-Range Order 14%
• Transmission Electron Microscopy 14%
• Silicon 14%
• X-Ray Photoelectron Spectroscopy 14%
• Thin Films 14%
• Phase Composition 14%