The atomic sputtering rate of the film composition from a Y-Ba-Cu-O target bombarded by argon ions was calculated, and there was the preferred effect with smaller copper atomic sputtering rate. The formation of in situ deposited high temperature superconducting film by ion beam sputtering was shown. The influence of experimental conditions on the film characteristics was discussed. The experimental results are in good agreement with the theoretical analysis.
|Number of pages||8|
|Journal||Weixi Jiagong Jishu/Microfabrication Technology|
|Publication status||Published - 1 Sep 1997|
ASJC Scopus subject areas
- Electrical and Electronic Engineering