Mechanism and experimental study on ion beam sputtering of in situ deposited high temperature superconducting film

Jianhua Hao, Xingrong Zhao, Fangqiao Zhou, Xinjian Yi

Research output: Journal article publicationJournal articleAcademic researchpeer-review

Abstract

The atomic sputtering rate of the film composition from a Y-Ba-Cu-O target bombarded by argon ions was calculated, and there was the preferred effect with smaller copper atomic sputtering rate. The formation of in situ deposited high temperature superconducting film by ion beam sputtering was shown. The influence of experimental conditions on the film characteristics was discussed. The experimental results are in good agreement with the theoretical analysis.
Original languageEnglish
Pages (from-to)32-39
Number of pages8
JournalWeixi Jiagong Jishu/Microfabrication Technology
Issue number3
Publication statusPublished - 1 Sep 1997
Externally publishedYes

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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