Measurement of opaque coating thickness using photothermal radiometry

S. J. Sheard; Michael Geoffrey Somekh

doi:10.1063/1.100161

Measurement of opaque coating thickness using photothermal radiometry

S. J. Sheard, Michael Geoffrey Somekh

Research output: Journal article publication › Journal article › Academic research › peer-review

3 Citations (Scopus)

Abstract

We describe a method for determination of film thickness using the photothermal radiometric microscope. The method is noncontacting and nondestructive, and is applicable to coatings covering the entire surface of the material. The frequency variation of both the amplitude and phase of the thermal wave response is used to determine the film thickness. This gives two independent measures. The technique is valid regardless of the properties of the substrate material, but is more accurate when these differ substantially from those of the coating.

Original language	English
Pages (from-to)	2715-2716
Number of pages	2
Journal	Applied Physics Letters
Volume	53
Issue number	26
DOIs	https://doi.org/10.1063/1.100161
Publication status	Published - 1 Dec 1988
Externally published	Yes

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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10.1063/1.100161

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AB - We describe a method for determination of film thickness using the photothermal radiometric microscope. The method is noncontacting and nondestructive, and is applicable to coatings covering the entire surface of the material. The frequency variation of both the amplitude and phase of the thermal wave response is used to determine the film thickness. This gives two independent measures. The technique is valid regardless of the properties of the substrate material, but is more accurate when these differ substantially from those of the coating.

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Measurement of opaque coating thickness using photothermal radiometry

Abstract

ASJC Scopus subject areas

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