Low-power CMOS compatible integrated gas sensor using maskless tin oxide sputtering

Lie yi Sheng; Zhenan Tang; Jian Wu; Philip Ching Ho Chan; Johnny K O Sin

Low-power CMOS compatible integrated gas sensor using maskless tin oxide sputtering

Lie yi Sheng
, Zhenan Tang
, Jian Wu
, Philip Ching Ho Chan
, Johnny K O Sin

Research output: Chapter in book / Conference proceeding › Conference article published in proceeding or book › Academic research › peer-review

5 Citations (Scopus)

Abstract

This paper describes a CMOS compatible integrated gas sensor. The device was designed to make the front-end of the fabrication to be fully compatible with the standard CMOS process. The non-CMOS compatible fabrication steps were carried out as post-processing steps. This included the silicon anisotropic etch to create the thermally isolated micro-hotplate (MHP) and the deposition of gas-sensitive thin-film. By using maskless r.f. SnO2 sputtering, we realized the high sensitivities to gases, such as ethanol and hydrogen.

Original language	English
Title of host publication	International Conference on Solid-State Sensors and Actuators, Proceedings
Publisher	IEEE
Pages	939-942
Number of pages	4
Publication status	Published - 1 Jan 1997
Externally published	Yes
Event	Proceedings of the 1997 International Conference on Solid-State Sensors and Actuators. Part 2 (of 2) - Chicago, IL, United States Duration: 16 Jun 1997 → 19 Jun 1997

Conference

Conference	Proceedings of the 1997 International Conference on Solid-State Sensors and Actuators. Part 2 (of 2)
Country/Territory	United States
City	Chicago, IL
Period	16/06/97 → 19/06/97

ASJC Scopus subject areas

General Engineering

Cite this

@inproceedings{cf0289e2165943509692f277b7b3e0f7,

title = "Low-power CMOS compatible integrated gas sensor using maskless tin oxide sputtering",

abstract = "This paper describes a CMOS compatible integrated gas sensor. The device was designed to make the front-end of the fabrication to be fully compatible with the standard CMOS process. The non-CMOS compatible fabrication steps were carried out as post-processing steps. This included the silicon anisotropic etch to create the thermally isolated micro-hotplate (MHP) and the deposition of gas-sensitive thin-film. By using maskless r.f. SnO2 sputtering, we realized the high sensitivities to gases, such as ethanol and hydrogen.",

author = "Sheng, \{Lie yi\} and Zhenan Tang and Jian Wu and Chan, \{Philip Ching Ho\} and Sin, \{Johnny K O\}",

year = "1997",

month = jan,

day = "1",

language = "English",

pages = "939--942",

booktitle = "International Conference on Solid-State Sensors and Actuators, Proceedings",

publisher = "IEEE",

address = "United States",

note = "Proceedings of the 1997 International Conference on Solid-State Sensors and Actuators. Part 2 (of 2) ; Conference date: 16-06-1997 Through 19-06-1997",

}

Sheng, LY, Tang, Z, Wu, J, Chan, PCH & Sin, JKO 1997, Low-power CMOS compatible integrated gas sensor using maskless tin oxide sputtering. in International Conference on Solid-State Sensors and Actuators, Proceedings. IEEE, pp. 939-942, Proceedings of the 1997 International Conference on Solid-State Sensors and Actuators. Part 2 (of 2), Chicago, IL, United States, 16/06/97.

Low-power CMOS compatible integrated gas sensor using maskless tin oxide sputtering. / Sheng, Lie yi; Tang, Zhenan; Wu, Jian et al.
International Conference on Solid-State Sensors and Actuators, Proceedings. IEEE, 1997. p. 939-942.

Research output: Chapter in book / Conference proceeding › Conference article published in proceeding or book › Academic research › peer-review

TY - GEN

T1 - Low-power CMOS compatible integrated gas sensor using maskless tin oxide sputtering

AU - Sheng, Lie yi

AU - Tang, Zhenan

AU - Wu, Jian

AU - Chan, Philip Ching Ho

AU - Sin, Johnny K O

PY - 1997/1/1

Y1 - 1997/1/1

N2 - This paper describes a CMOS compatible integrated gas sensor. The device was designed to make the front-end of the fabrication to be fully compatible with the standard CMOS process. The non-CMOS compatible fabrication steps were carried out as post-processing steps. This included the silicon anisotropic etch to create the thermally isolated micro-hotplate (MHP) and the deposition of gas-sensitive thin-film. By using maskless r.f. SnO2 sputtering, we realized the high sensitivities to gases, such as ethanol and hydrogen.

AB - This paper describes a CMOS compatible integrated gas sensor. The device was designed to make the front-end of the fabrication to be fully compatible with the standard CMOS process. The non-CMOS compatible fabrication steps were carried out as post-processing steps. This included the silicon anisotropic etch to create the thermally isolated micro-hotplate (MHP) and the deposition of gas-sensitive thin-film. By using maskless r.f. SnO2 sputtering, we realized the high sensitivities to gases, such as ethanol and hydrogen.

UR - https://www.scopus.com/pages/publications/0030648202

M3 - Conference article published in proceeding or book

SP - 939

EP - 942

BT - International Conference on Solid-State Sensors and Actuators, Proceedings

PB - IEEE

T2 - Proceedings of the 1997 International Conference on Solid-State Sensors and Actuators. Part 2 (of 2)

Y2 - 16 June 1997 through 19 June 1997

ER -

Low-power CMOS compatible integrated gas sensor using maskless tin oxide sputtering

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ASJC Scopus subject areas

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