@inproceedings{40badae974804e1b8fe4b2e4f685eb91,
title = "Low-Loss 800nm-Thick PECVD Silicon Nitride Photonic Platform on 300-mm Wafer",
abstract = "In this paper we demonstrate the development and optimization of an 800 nm-thick Plasma-enhanced chemical vapor deposition (PECVD) silicon nitride (SiN) photonic platform on a 300-mm silicon wafer. The implementation of ArF immersion lithography contributes to superior manufacturing processes, as it provides excellent critical dimension (CD) uniformity inter- and intra-wafers, make it an optimal platform of production of integrated circuits and nanoscale devices.",
keywords = "Photonic platform, Photonics waveguides, Silicon Nitride",
author = "Hong Cai and Bo Li and Yiding Lin and Haitao Yu and Lee, \{Steven Hou Jang\} and Tew, \{Chin Khang\} and Yoo, \{Jae Ok\} and Charmaine Goh and Shervonne Woon and Ng, \{Doris Keh Ting\} and Navab Singh and Xianshu Luo and Lee, \{Lennon Yao Ting\}",
note = "Publisher Copyright: {\textcopyright} 2024 SPIE.; Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVII 2024 ; Conference date: 28-01-2024 Through 31-01-2024",
year = "2024",
month = mar,
doi = "10.1117/12.3002146",
language = "English",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "\{von Freymann\}, Georg and Eva Blasco and Debashis Chanda",
booktitle = "Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVII",
address = "United States",
}