Abstract
The pyramid-to-dome transition in GexSi1-xon Si(100) initiated by step formation on pyramidal quantum dots is atomistically simulated using a multistate lattice model in two-dimensions incorporating effective surface reconstructions. Under quasiequilibrium growth conditions associated with low deposition rates, the transition occurs at island size ncfollowing √ nc∼ x-1.69independent of temperature and deposition rate. The shape transition is found to be an activated process. Results are explained by a theory based on simple forms of facet energies and elastic energies estimated using a shallow island approximation. An asymptotic scaling relation nc1/d∼ x-2for x→0 applicable to d=2 or 3 dimensions is derived. The shape transition energy barrier can be dominated by the interface energy between steep and shallow facets.
Original language | English |
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Article number | 064328 |
Journal | Journal of Applied Physics |
Volume | 108 |
Issue number | 6 |
DOIs | |
Publication status | Published - 15 Sept 2010 |
ASJC Scopus subject areas
- General Physics and Astronomy