Ion beam sputtering deposition and etching of high T_cYBCO superconducting thin films

In this paper we present studies of the growth and etching for YBCO thin superconducting films using the LD-3 type ion beam sputtering machine. A focusing Kaufman-type ion source was used to form YBCO thin films with a ceramic target and a powder target. We discuss the composition of YBCO films dependence on the substrate temperature, target composition and the pressure of the sputtering gas. MgO, ZrO2and SrTiO3single-crystal substrates were used. The typical deposition parameters have been given. The best results with Tcnof 96 K and Tco85 K have been obtained. The characteristics of the orientation and structure were analysed by the SEM and XRD methods. In addition, we also patterned YBCO films as a microbridge and a meander with a parallel Kaufman-type Ar ion source. We substitute ion beam etching for chemical wet etching by the etching lithographic technique. The typical etching parameters have been given. The pattern edge was uniform with no evidence of an interface between the layers. We have succeeded in fabricating high Tcsuperconducting ir detector using the dry technique without degradation of superconducting properties. Further work is presently under way.