Investigation of rotational magnetic field assisted hot filament chemical vapor deposition for diamond film growth

Fung Ming Kwok, Xinyu Du, Zhanwen Sun, Man Cheung Ng, Wai Sze Yip (Corresponding Author), Kwong Yu David Kwok (Corresponding Author), Suet To (Corresponding Author)

Research output: Journal article publicationJournal articleAcademic researchpeer-review

1 Citation (Scopus)

Abstract

This study investigates the role of magnetic fields in Hot Filament Chemical Vapor Deposition (HFCVD), revealing their remarkable ability to precisely control film characteristics. The study confirms the ability of this novel technology to produce uniformly high-quality diamond films by examining a variety of magnetic orientations and rotational velocity, as well as a control with no magnetic field, both experimentally and through simulation. It is discovered that magnetic fields contribute to enhance deposition consistency and grain size regulation, with the SN (South-North) orientation producing the most effective results. The SN orientation yields the most consistent diamond film thicknesses, with values clustering around 7.3 μm at the center and 7.66 μm at the edges, outperforming the SS (South-South) orientation and NMF (no magnetic field) condition. The study also shows that magnetic field integration improves film uniformity and significantly increases thermal distribution, resulting in more efficient thermal management profiles. These findings highlight the potential of HFCVD with magnetic field assistance to create particular diamond films, increasing its importance in advanced thermal management and broadening its application landscape in industries requiring precise film characteristics.

Original languageEnglish
Article number131588
Number of pages16
JournalSurface and Coatings Technology
Volume495
DOIs
Publication statusPublished - 1 Jan 2025

Keywords

  • Diamond coating
  • Diamond thin films
  • Hot filament chemical vapor deposition
  • Magnetic field assistance
  • Magnetic field orientation

ASJC Scopus subject areas

  • General Chemistry
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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