Investigation and control of microcracks in tin oxide gas sensing thin-films

Zhenan Tang, Philip Ching Ho Chan, Rajnish K. Sharma, Guizhen Yan, I. Ming Hsing, Johnny K O Sin

Research output: Journal article publicationJournal articleAcademic researchpeer-review

32 Citations (Scopus)


In this paper, the role of microcracks in tin oxide gas sensing thin-films caused by high temperature annealing is discussed. In our research, cracks in rf sputtered tin oxide thin-films annealed at different conditions were investigated with scanning electron microscopy (SEM). Two techniques were used to reduce the cracking. The first was the use of tin oxide thin-films with copper-doping. The second method involved smoothing the underlying surface through the use of phosphorus-doped silicon glass (PSG). The role of the cracks for enhancing diffusion of moisture and oxygen is discussed using a revised short-circuiting pathway model.
Original languageEnglish
Pages (from-to)39-47
Number of pages9
JournalSensors and Actuators, B: Chemical
Issue number1
Publication statusPublished - 25 Sept 2001
Externally publishedYes


  • Microcracks
  • Thin-film
  • Tin oxide

ASJC Scopus subject areas

  • Analytical Chemistry
  • Electrochemistry
  • Electrical and Electronic Engineering


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