Internal stress and surface morphology of zinc oxide thin films deposited by filtered cathodic vacuum arc technique

H. W. Lee, Shu Ping Lau, Y. G. Wang, B. K. Tay, H. H. Hng

Research output: Journal article publicationJournal articleAcademic researchpeer-review

47 Citations (Scopus)

Abstract

A radius of curvature technique was used to study stresses in zinc oxide (ZnO) films prepared by filtered cathodic vacuum arc. To deposit the films, a pure zinc target was used and O2was fed into the chamber. It was found that stresses in ZnO films are strongly correlated to the growth parameters of substrate temperature, substrate bias and oxygen pressure. The films prepared for studying the effect of substrate bias and oxygen pressure exhibited only compressive stress. For the films prepared to investigate the effect of substrate temperature, a transition from compressive to tensile stress was observed when the temperature was varied from 100 to 420 °C. The tensile stress is attributed to thermal stress caused by the difference in thermal expansion coefficients of the film and the substrate. Atomic force microscope images of the films were obtained to study their surface morphology. It is found that the surface morphology is significantly influenced by the growth parameters.
Original languageEnglish
Pages (from-to)15-19
Number of pages5
JournalThin Solid Films
Volume458
Issue number1-2
DOIs
Publication statusPublished - 30 Jun 2004

Keywords

  • Filtered cathodic vacuum arc
  • Stress
  • Zinc oxide

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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