Abstract
Anisotropic silicon etching techniques are widely used in various microsensors to create thermally isolated structures of micro-hotplate. Ethylene-diamine-pyrocatechol is one of the most commonly used anisotropic etchants. To integrate sensor arrays of various types of SnO2 thin-film sensors on the microstructure, a way to photolithographically pattern the SnO2 thin-film is needed. The results from such experiments are discussed.
| Original language | English |
|---|---|
| Title of host publication | Proceedings of the IEEE Hong Kong Electron Devices Meeting |
| Publisher | IEEE |
| Pages | 145-148 |
| Number of pages | 4 |
| Publication status | Published - 1 Dec 1997 |
| Externally published | Yes |
| Event | Proceedings of the 1997 IEEE Hong Kong Electron Devices Meeting - Hong Kong, Hong Kong Duration: 30 Aug 1997 → 30 Aug 1997 |
Conference
| Conference | Proceedings of the 1997 IEEE Hong Kong Electron Devices Meeting |
|---|---|
| Country/Territory | Hong Kong |
| City | Hong Kong |
| Period | 30/08/97 → 30/08/97 |
ASJC Scopus subject areas
- General Engineering
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