Abstract
Anisotropic silicon etching techniques are widely used in various microsensors to create thermally isolated structures of micro-hotplate. Ethylene-diamine-pyrocatechol is one of the most commonly used anisotropic etchants. To integrate sensor arrays of various types of SnO2 thin-film sensors on the microstructure, a way to photolithographically pattern the SnO2 thin-film is needed. The results from such experiments are discussed.
Original language | English |
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Title of host publication | Proceedings of the IEEE Hong Kong Electron Devices Meeting |
Publisher | IEEE |
Pages | 145-148 |
Number of pages | 4 |
Publication status | Published - 1 Dec 1997 |
Externally published | Yes |
Event | Proceedings of the 1997 IEEE Hong Kong Electron Devices Meeting - Hong Kong, Hong Kong Duration: 30 Aug 1997 → 30 Aug 1997 |
Conference
Conference | Proceedings of the 1997 IEEE Hong Kong Electron Devices Meeting |
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Country/Territory | Hong Kong |
City | Hong Kong |
Period | 30/08/97 → 30/08/97 |
ASJC Scopus subject areas
- General Engineering