Infrared reflective property of AZO films prepared by RF magnetron sputtering

D. G. Miao, Shou-xiang Kinor Jiang, Songmin Shang, Z. M. Chen, J. Liu

Research output: Journal article publicationJournal articleAcademic researchpeer-review

10 Citations (Scopus)

Abstract

S. Maney & Son Ltd. Al doped ZnO (AZO) films were prepared on glass substrates by radio frequency (RF) magnetron sputtering technology. Surface morphology, crystal structure, chemical composition, UV-visible transmittance, electrical and infrared properties of the AZO films were investigated by atomic force microscopy, scanning electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy, Spectrophotometer, Hall measurement system and Fourier Transform infrared spectroscopy, respectively. The results indicate that AZO films with strong c-axis preferred wurtzite structure were successfully prepared by RF magnetron sputtering at room temperature. The average visible transmittance and infrared reflection rate (from 1·5 to 25 mm) of the deposited films was 84·8 and 30%, respectively. The study creates a sound basis for investigating the infrared properties of AZO films for future heat shielding films.
Original languageEnglish
Pages (from-to)321-325
Number of pages5
JournalMaterials Technology
Volume29
Issue number6
DOIs
Publication statusPublished - 1 Jan 2014

Keywords

  • Al doped ZnO
  • Infrared reflection
  • RF magnetron sputtering
  • Thin films

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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