Influences of Remote Coulomb and Interface-Roughness Scatterings on Electron Mobility of InGaAs nMOSFET with High-k Stacked Gate Dielectric

Li Sheng Wang, Jing Ping Xu, Lu Liu, Yuan Huang, Han Han Lu, Pui To Lai, Wing Man Tang

Research output: Journal article publication › Journal article › Academic research › peer-review

13 Citations (Scopus)

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