Influence of thermal annealing on optical properties and structure of aluminium oxide thin films by filtered cathodic vacuum arc

Z. W. Zhao, B. K. Tay, L. Huang, Shu Ping Lau, J. X. Gao

Research output: Journal article publicationJournal articleAcademic researchpeer-review

14 Citations (Scopus)

Abstract

Optical and structural properties of aluminium oxide thin films are investigated in the annealing temperature range of 200-900°C. The changes in optical properties and film structure show the great dependence on the temperature. For the film annealed at low temperatures (from 200°C to 600°C), the film optical properties, such as transmittance and optical constants, could be improved by thermal annealing with amorphous structure and smooth surface. However, for the film annealed at higher temperature (e.g. 900°C), the poor performance of optical properties indicates undesirable application for precise use in optics due to significant changes in both structure and surface roughness. At optimum annealing temperature of 600°C, the transmittance could reach as high as that of substrate and the film possesses better optical constants (refractive index was 1.73 and extinction coefficient was ∼10-4at 550 nm) with remaining amorphous structure and smooth surface.
Original languageEnglish
Pages (from-to)465-469
Number of pages5
JournalOptical Materials
Volume27
Issue number3
DOIs
Publication statusPublished - 1 Dec 2004
Externally publishedYes

Keywords

  • Aluminium oxide
  • Optical properties
  • Thermal annealing

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Computer Science(all)
  • Atomic and Molecular Physics, and Optics
  • Electrical and Electronic Engineering

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