Abstract
Cathodic vacuum arc deposition in (Ti,Al)N films was carried out and the effect of negative substrate bias on the mechanical properties of the films was studied. The internal stress, crystal structure, microhardness and Young's Modulus of the films were evaluated. The deposition rate decreased linearly with increasing substrate bias. The films were amorphous and porous at 0 gate bias due to low internal stress. Increased substrate bias caused film densification and decreased defect density in the films, improving their hardness and other mechanical properties.
| Original language | English |
|---|---|
| Pages (from-to) | 736-742 |
| Number of pages | 7 |
| Journal | Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films |
| Volume | 19 |
| Issue number | 3 |
| DOIs | |
| Publication status | Published - 1 May 2001 |
| Externally published | Yes |
ASJC Scopus subject areas
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films