Influence of processing conditions on the structure of strontium titanate thin films grown on si by laser mbe

X. Y. Zhou; J. Miao; X. B. Lu; P. F. Lee; Jiyan Dai; H. L.W. Chan; C. L. Choy; Y. Wang

doi:10.1080/10584580601085222

Influence of processing conditions on the structure of strontium titanate thin films grown on si by laser mbe

X. Y. Zhou, J. Miao, X. B. Lu, P. F. Lee, Jiyan Dai, H. L.W. Chan, C. L. Choy, Y. Wang

Research output: Journal article publication › Journal article › Academic research › peer-review

3 Citations (Scopus)

Abstract

Epitaxial SrTiO3 thin films have been deposited on Si (100) substrates by laser molecular-beam epitaxy. The experiments have confirmed that the use of Sr buffer layer is essential for making high quality SrTiO3 film. Apart from this, processing parameters including the deposition temperature and time for each layer also have significant influence on the crystallinity and roughness of SrTiO3. The thin films prepared under optimized conditions were found to have a pure perovskite phase, well crystallized and epitaxially aligned. The electrical measurements indicate that the SrTiO3 film has a capacitance effective thickness of less than 16.

Original language	English
Pages (from-to)	109-116
Number of pages	8
Journal	Integrated Ferroelectrics
Volume	86
Issue number	1
DOIs	https://doi.org/10.1080/10584580601085222
Publication status	Published - 1 Jan 2006

Keywords

Epitaxy
Laser MBE
Strontium titanate
Thin film

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Control and Systems Engineering
Ceramics and Composites
Condensed Matter Physics
Electrical and Electronic Engineering
Materials Chemistry

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10.1080/10584580601085222

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title = "Influence of processing conditions on the structure of strontium titanate thin films grown on si by laser mbe",

abstract = "Epitaxial SrTiO3 thin films have been deposited on Si (100) substrates by laser molecular-beam epitaxy. The experiments have confirmed that the use of Sr buffer layer is essential for making high quality SrTiO3 film. Apart from this, processing parameters including the deposition temperature and time for each layer also have significant influence on the crystallinity and roughness of SrTiO3. The thin films prepared under optimized conditions were found to have a pure perovskite phase, well crystallized and epitaxially aligned. The electrical measurements indicate that the SrTiO3 film has a capacitance effective thickness of less than 16.",

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AU - Zhou, X. Y.

AU - Miao, J.

AU - Lu, X. B.

AU - Lee, P. F.

AU - Dai, Jiyan

AU - Chan, H. L.W.

AU - Choy, C. L.

AU - Wang, Y.

PY - 2006/1/1

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N2 - Epitaxial SrTiO3 thin films have been deposited on Si (100) substrates by laser molecular-beam epitaxy. The experiments have confirmed that the use of Sr buffer layer is essential for making high quality SrTiO3 film. Apart from this, processing parameters including the deposition temperature and time for each layer also have significant influence on the crystallinity and roughness of SrTiO3. The thin films prepared under optimized conditions were found to have a pure perovskite phase, well crystallized and epitaxially aligned. The electrical measurements indicate that the SrTiO3 film has a capacitance effective thickness of less than 16.

AB - Epitaxial SrTiO3 thin films have been deposited on Si (100) substrates by laser molecular-beam epitaxy. The experiments have confirmed that the use of Sr buffer layer is essential for making high quality SrTiO3 film. Apart from this, processing parameters including the deposition temperature and time for each layer also have significant influence on the crystallinity and roughness of SrTiO3. The thin films prepared under optimized conditions were found to have a pure perovskite phase, well crystallized and epitaxially aligned. The electrical measurements indicate that the SrTiO3 film has a capacitance effective thickness of less than 16.

KW - Epitaxy

KW - Laser MBE

KW - Strontium titanate

KW - Thin film

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Influence of processing conditions on the structure of strontium titanate thin films grown on si by laser mbe

Abstract

Keywords

ASJC Scopus subject areas

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