Influence of oxygen background pressure on the structure and properties of epitaxial SrTiO3/La0.35Nd0.35Sr0.3MnO 3 heterostructures grown by pulsed laser deposition

Wenbin Wu, K. H. Wong, Chee Leung Mak, Geoffrey Pang, C. L. Choy, Yuheng Zhang

Research output: Journal article publicationJournal articleAcademic researchpeer-review

4 Citations (Scopus)

Abstract

Epitaxial La0.35Nd0.35Sr0.3MnO3(LNSMO) films and SrTiO3(STO)/LNSMO heterostructures have been grown on LaAlO3substrates by pulsed laser deposition. The effect of oxygen content on structure and properties of both the LNSMO and STO/LNSMO films was investigated through x-ray diffraction, atomic force microscopy, and resistivity-temperature measurements. It is found that the out-of-plane lattice constant and the metallic-semiconducting transition temperature of the LNSMO films are greatly influenced by the oxygen pressure during deposition, but, insensitive to the in situ annealing oxygen pressure ranging from 2 X 10-6to 10 Torr after the deposition. For the STO/ LNSMO heterostructures, oxygen out-diffusion from the LNSMO layer is evidenced when the top STO is deposited at an oxygen pressure of less than 5 X 10-4Torr and temperatures higher than 500°C. Our results strongly suggest that at the surface of as-grown LNSMO films a native passivation layer for oxygen diffusion may exist, and this layer could be damaged after depositing the STO film at reduced oxygen pressures.
Original languageEnglish
Pages (from-to)2378-2383
Number of pages6
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume18
Issue number5
Publication statusPublished - 1 Sep 2000

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Physics and Astronomy (miscellaneous)
  • Surfaces and Interfaces
  • Condensed Matter Physics

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