Influence of defect layer absorption on narrow band far infrared filter

Chao Wang, Jiaming Shi, Dapeng Zhao, Jiachun Wang, Zongsheng Chen, Zhongcai Yuan, Bo Xu, Zhidan Lin, Li Cheng, Kezheng Dang

Research output: Journal article publicationJournal articleAcademic researchpeer-review

Abstract

The influence of the absorption of the defect layer, the imaginary part of the refractive index (n), on the properties of the thin-film infrared filter with a narrow-band pass was evaluated by means of the characteristic matrix method. The calculated results show that the absorption of the defect layer significantly affects the properties of the filter, such as the number of the omni-directional band gap, its band width, and its band gap rate. For example, as n=2.2-0i changed into n=2.2-0.03i, two omni-directional band gaps were observed with decreasing band width and band gap rate. When n=2.2-0.05i and n=2.2-0.1i, only one omni-directional gap was observed with reduced band width and band gap rate. When n=2.2-0.3i, the omni-directional gap vanished. As the reflectance of the defect layer increased, both the transmittance and absorptance (if any) slowly decreased to zero.
Original languageEnglish
Pages (from-to)1057-1060
Number of pages4
JournalZhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology
Volume33
Issue number10
DOIs
Publication statusPublished - 1 Oct 2013
Externally publishedYes

Keywords

  • Absorption
  • Narrowband filter
  • Omnidirectional band gap
  • Reflectance rate
  • Transmittance rate

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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