In situ fabrication of a cross-bridge Kelvin resistor structure by focused ion beam microscopy

Chi Wah Leung, C. Bell, G. Burnell, M. G. Blamire

Research output: Journal article publicationJournal articleAcademic researchpeer-review

11 Citations (Scopus)

Abstract

We report the fabrication of sub-micron cross-bridge Kelvin resistors from planar device heterostructures, utilizing a three-dimensional focused ion beam etching technique. By means of a conventional spin valve multilayer, we demonstrate that this geometry eliminates the parasitic resistances of the interconnects, permitting direct probing of device resistances in nanoscale dimensions. It is anticipated that such a technique can be applied to resistance measurements with current-perpendicular-to-plane device geometry in various material systems.
Original languageEnglish
Pages (from-to)786-789
Number of pages4
JournalNanotechnology
Volume15
Issue number7
DOIs
Publication statusPublished - 1 Jul 2004
Externally publishedYes

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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