Improvement of silicon dioxide ridge waveguides using low temperature thermal annealing

J. W. Parks; H. Cai; T. Wall; M. Stott; E. Hamilton; R. Chu; A. R. Hawkins; H. Schmidt

Improvement of silicon dioxide ridge waveguides using low temperature thermal annealing

J. W. Parks, H. Cai, T. Wall, M. Stott, E. Hamilton, R. Chu, A. R. Hawkins, H. Schmidt

Research output: Chapter in book / Conference proceeding › Conference article published in proceeding or book › Academic research › peer-review

Abstract

Penetration of liquids into SiO₂ ridge waveguides during standard processing steps is shown to cause poor mode confinement and increased loss. Thermal annealing repeatedly restores a core with uniform index and low-loss mode confinement.

Original language	English
Title of host publication	2015 Conference on Lasers and Electro-Optics, CLEO 2015
Publisher	Institute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)	9781557529688
Publication status	Published - 10 Aug 2015
Externally published	Yes
Event	Conference on Lasers and Electro-Optics, CLEO 2015 - San Jose, United States Duration: 10 May 2015 → 15 May 2015

Publication series

Name	Conference on Lasers and Electro-Optics Europe - Technical Digest
Volume	2015-August

Conference

Conference	Conference on Lasers and Electro-Optics, CLEO 2015
Country/Territory	United States
City	San Jose
Period	10/05/15 → 15/05/15

Keywords

Annealing
Indexes
Liquid waveguides
Liquids
Optical waveguides
Semiconductor waveguides
Silicon compounds

ASJC Scopus subject areas

Electrical and Electronic Engineering
Atomic and Molecular Physics, and Optics
Electronic, Optical and Magnetic Materials

Cite this

Parks, J. W., Cai, H., Wall, T., Stott, M., Hamilton, E., Chu, R., Hawkins, A. R., & Schmidt, H. (2015). Improvement of silicon dioxide ridge waveguides using low temperature thermal annealing. In 2015 Conference on Lasers and Electro-Optics, CLEO 2015 Article 7184026 (Conference on Lasers and Electro-Optics Europe - Technical Digest; Vol. 2015-August). Institute of Electrical and Electronics Engineers Inc..

@inproceedings{c817d7a906694a4caa32c7d27309ff1a,

title = "Improvement of silicon dioxide ridge waveguides using low temperature thermal annealing",

abstract = "Penetration of liquids into SiO2 ridge waveguides during standard processing steps is shown to cause poor mode confinement and increased loss. Thermal annealing repeatedly restores a core with uniform index and low-loss mode confinement.",

keywords = "Annealing, Indexes, Liquid waveguides, Liquids, Optical waveguides, Semiconductor waveguides, Silicon compounds",

author = "Parks, {J. W.} and H. Cai and T. Wall and M. Stott and E. Hamilton and R. Chu and Hawkins, {A. R.} and H. Schmidt",

note = "Publisher Copyright: {\textcopyright} 2015 OSA.; Conference on Lasers and Electro-Optics, CLEO 2015 ; Conference date: 10-05-2015 Through 15-05-2015",

year = "2015",

month = aug,

day = "10",

language = "English",

series = "Conference on Lasers and Electro-Optics Europe - Technical Digest",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

booktitle = "2015 Conference on Lasers and Electro-Optics, CLEO 2015",

}

Parks, JW, Cai, H, Wall, T, Stott, M, Hamilton, E, Chu, R, Hawkins, AR & Schmidt, H 2015, Improvement of silicon dioxide ridge waveguides using low temperature thermal annealing. in 2015 Conference on Lasers and Electro-Optics, CLEO 2015., 7184026, Conference on Lasers and Electro-Optics Europe - Technical Digest, vol. 2015-August, Institute of Electrical and Electronics Engineers Inc., Conference on Lasers and Electro-Optics, CLEO 2015, San Jose, United States, 10/05/15.

Improvement of silicon dioxide ridge waveguides using low temperature thermal annealing. / Parks, J. W.; Cai, H.; Wall, T. et al.
2015 Conference on Lasers and Electro-Optics, CLEO 2015. Institute of Electrical and Electronics Engineers Inc., 2015. 7184026 (Conference on Lasers and Electro-Optics Europe - Technical Digest; Vol. 2015-August).

Research output: Chapter in book / Conference proceeding › Conference article published in proceeding or book › Academic research › peer-review

TY - GEN

T1 - Improvement of silicon dioxide ridge waveguides using low temperature thermal annealing

AU - Parks, J. W.

AU - Cai, H.

AU - Wall, T.

AU - Stott, M.

AU - Hamilton, E.

AU - Chu, R.

AU - Hawkins, A. R.

AU - Schmidt, H.

PY - 2015/8/10

Y1 - 2015/8/10

N2 - Penetration of liquids into SiO2 ridge waveguides during standard processing steps is shown to cause poor mode confinement and increased loss. Thermal annealing repeatedly restores a core with uniform index and low-loss mode confinement.

AB - Penetration of liquids into SiO2 ridge waveguides during standard processing steps is shown to cause poor mode confinement and increased loss. Thermal annealing repeatedly restores a core with uniform index and low-loss mode confinement.

KW - Annealing

KW - Indexes

KW - Liquid waveguides

KW - Liquids

KW - Optical waveguides

KW - Semiconductor waveguides

KW - Silicon compounds

UR - http://www.scopus.com/inward/record.url?scp=84954051565&partnerID=8YFLogxK

M3 - Conference article published in proceeding or book

AN - SCOPUS:84954051565

T3 - Conference on Lasers and Electro-Optics Europe - Technical Digest

BT - 2015 Conference on Lasers and Electro-Optics, CLEO 2015

PB - Institute of Electrical and Electronics Engineers Inc.

T2 - Conference on Lasers and Electro-Optics, CLEO 2015

Y2 - 10 May 2015 through 15 May 2015

ER -

Improvement of silicon dioxide ridge waveguides using low temperature thermal annealing

Abstract

Publication series

Conference

Keywords

ASJC Scopus subject areas

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