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Improved interfacial and electrical properties of few-layered MoS 2 FETs with plasma-treated Al 2 O 3 as gate dielectric

  • Xingjuan Song
  • , Jingping Xu
  • , Lu Liu
  • , Pui To Lai
  • , Wing Man Tang

Research output: Journal article publication › Journal article › Academic research › peer-review

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Material Science