Keyphrases
Copper Substrate
100%
Chromium
100%
Interfacial Adhesion
100%
Diamond Film
100%
Film Substrate
100%
Diamond Composite
100%
Composite Interlayer
100%
Hot Filament Chemical Vapor Deposition (HFCVD)
50%
Electroplating
25%
Indentation Test
25%
Rapid Cooling
25%
Composite Layer
25%
Cu Substrate
25%
Interfacial Characteristics
25%
Interface Adhesion
25%
Diamond Particles
25%
Diamond Coating
25%
Scanning Electron Microscopy Test
25%
Engineering
Copper Substrate
100%
Interfacial Adhesion
100%
Diamond
100%
Interlayer
100%
Vapor Deposition
28%
Chemical Vapor Deposition
28%
Copper (Cu)
14%
Rapid Cooling
14%
Indentation
14%
Diamond Coating
14%
Material Science
Composite Material
100%
Chromium
100%
Diamond
100%
Diamond Films
100%
Hot-Filament Chemical Vapor Deposition
40%
Indentation Hardness Testing
20%
Scanning Electron Microscopy
20%
Electroplating
20%
Chemical Engineering
Film
100%
Chemical Vapor Deposition
66%
Vapor Deposition
66%
Electrodeposition
33%