Keyphrases
Plasma-enhanced Chemical Vapor Deposition (PECVD)
100%
Hydrogen-free
100%
Ultrathin
100%
Nickel Film
100%
Chemical Vapor Deposition Growth
100%
Few-layer Graphene
100%
Dissolution Temperature
100%
Carbon Dissolution
37%
Carbon Atom
25%
G Peak
25%
Deposition Time
25%
Threshold Temperature
25%
Low Temperature
12%
In Situ
12%
Si Substrate
12%
Silica
12%
Raman Scattering
12%
3-layer
12%
Deposited Carbon
12%
Film Surface
12%
G-band
12%
Low Solubility
12%
Transmittance
12%
Ultra-low
12%
Peak Ratio
12%
Graphene
12%
Nickel Matrix
12%
Graphene Layer number
12%
Raman Scattering Analysis
12%
Engineering
Few-Layer Graphene
100%
Vapor Deposition
100%
Chemical Vapor Deposition
100%
Deposition Time
28%
Threshold Temperature
28%
Raman Spectra
28%
Low-Temperature
14%
Graphene
14%
Critical Thickness
14%
Si Substrate
14%
Film Surface
14%
Coated Film
14%
Peak Intensity
14%
Layer Graphene
14%
Graphene Sheet
14%
Silicon Dioxide
14%
Material Science
Few-Layer Graphene
100%
Plasma-Enhanced Chemical Vapor Deposition
100%
Film
100%
Graphene
25%
Linewidth
12%
Surface (Surface Science)
12%