Abstract
We propose a methodology for fabricating a hybrid-core planar waveguide mode multiplexer using multi-step photolithography and demonstrate the manipulation of the fundamental mode without affecting the high-order modes in the experiment. We design and fabricate the proposed mode multiplexer, and our experimental device provides coupling ratios for the fundamental mode that are higher than 92.0 % and 91.6 % for the transverse-electric (TE) and transverse-magnetic (TM) polarizations and the modal crosstalks are lower than −10.6 dB and −10.4 dB for the TE and TM polarizations, respectively, over the C + L band. The device is confirmed to be low sensitivity to the state of polarization. The proposed methodology can be further developed to realize the fabrication of a two-material system heterogeneous integrated photonic device.
| Original language | English |
|---|---|
| Article number | 110798 |
| Pages (from-to) | 1-5 |
| Journal | Optics and Laser Technology |
| Volume | 175 |
| DOIs | |
| Publication status | Published - Aug 2024 |
Keywords
- Heterogeneous integrated photonic device
- Mode multiplexer
- Optical waveguide
- Photolithography
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Electrical and Electronic Engineering
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