Abstract
Our recent study showed that octa-level fringe patterns can further reduce the phase rms error at no extra cost and patch-based fringe patterns can cause harmonic distortion to the measured depth map. This paper presents a novel method to produce patch-based octa-level fringe patterns of ideal noise characteristics by (1) formulating the optimization problem in a better way, (2) starting the optimization process with a better initial estimate and (3) adopting a necessity-oriented strategy to refine the fringe patterns during the optimization process.
| Original language | English |
|---|---|
| Pages (from-to) | 99-106 |
| Number of pages | 8 |
| Journal | Optics and Lasers in Engineering |
| Volume | 98 |
| DOIs | |
| Publication status | Published - 1 Nov 2017 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Mechanical Engineering
- Electrical and Electronic Engineering
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