Our recent study showed that octa-level fringe patterns can further reduce the phase rms error at no extra cost and patch-based fringe patterns can cause harmonic distortion to the measured depth map. This paper presents a novel method to produce patch-based octa-level fringe patterns of ideal noise characteristics by (1) formulating the optimization problem in a better way, (2) starting the optimization process with a better initial estimate and (3) adopting a necessity-oriented strategy to refine the fringe patterns during the optimization process.
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Mechanical Engineering
- Electrical and Electronic Engineering