HFCVD of diamond and its application as electrode in aluminum electrolysis

Shanshan Wang; Guohua Chen; Fenglin Yang

doi:10.1016/j.tsf.2009.01.035

HFCVD of diamond and its application as electrode in aluminum electrolysis

Shanshan Wang, Guohua Chen, Fenglin Yang

Research output: Journal article publication › Journal article › Academic research › peer-review

7 Citations (Scopus)

Abstract

The Hall-Heroult process of aluminum production is featured by the release of CO2as a result of the sacrificing graphite anode. Finding a proper inert anode active in oxygen evolution has been a research topic for electrochemists to have a green process of aluminum electrolysis. A thin layer of diamond coating on silicon substrate has shown some promises. The challenges for the project are two folds, fabricating stable and active diamond electrode, and controlling proper electrolysis condition so as not to degrade the diamond thin film. This paper reports the recent findings from the authors' lab dealing with both challenges.

Original language	English
Pages (from-to)	3559-3561
Number of pages	3
Journal	Thin Solid Films
Volume	517
Issue number	12
DOIs	https://doi.org/10.1016/j.tsf.2009.01.035
Publication status	Published - 30 Apr 2009
Externally published	Yes

Keywords

Boron-doped-diamond film
Hot-filament chemical vapor deposition
Low temperature aluminum electrolysis
Silicon wafer

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

More information

10.1016/j.tsf.2009.01.035

Cite this

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AB - The Hall-Heroult process of aluminum production is featured by the release of CO2as a result of the sacrificing graphite anode. Finding a proper inert anode active in oxygen evolution has been a research topic for electrochemists to have a green process of aluminum electrolysis. A thin layer of diamond coating on silicon substrate has shown some promises. The challenges for the project are two folds, fabricating stable and active diamond electrode, and controlling proper electrolysis condition so as not to degrade the diamond thin film. This paper reports the recent findings from the authors' lab dealing with both challenges.

KW - Boron-doped-diamond film

KW - Hot-filament chemical vapor deposition

KW - Low temperature aluminum electrolysis

KW - Silicon wafer

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IS - 12

ER -

HFCVD of diamond and its application as electrode in aluminum electrolysis

Abstract

Keywords

ASJC Scopus subject areas

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