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Keyphrases
Photoinduced
100%
Chemical Vapor Deposition
100%
Silicate Film
100%
TS-1
100%
Rutile
60%
Tetraethoxysilane
60%
Refractive Index
40%
Precursor Solution
40%
Ti-O
40%
X-ray Photoelectron Spectroscopy
20%
Fourier Transform Infrared Spectroscopy (FT-IR)
20%
Si Substrate
20%
Silica
20%
Cyclohexane
20%
Spectroscopic Measurement
20%
Photochemical Reaction
20%
Atomic Fraction
20%
Growth Rate
20%
Low Carbon
20%
Reaction Chamber
20%
Ellipsometry
20%
Ti Content
20%
Injector
20%
Small Features
20%
TiSi
20%
Solution Composition
20%
Vaporizer
20%
Excimer Lamp
20%
Si Absorption
20%
Ti-silicate
20%
Engineering
Precursor Solution
100%
Thin Films
100%
Vapor Deposition
100%
Chemical Vapor Deposition
100%
Refractive Index
100%
Refractivity
100%
Reaction Chamber
50%
Ray Photoelectron Spectroscopy
50%
Si Substrate
50%
Smallest Feature
50%
Vaporizer
50%
Excimer Lamp
50%
Fourier Transform
50%
Earth and Planetary Sciences
Thin Films
100%
Refractivity
100%
Vapor Deposition
100%
Infrared Radiation
50%
Ellipsometry
50%
Photoelectron Spectroscopy
50%
Cyclohexane
50%
Excimer
50%
Photochemical Reaction
50%
X Ray
50%
Material Science
Chemical Vapor Deposition
100%
Film
100%
Titanium
100%
Silicate
100%
Thin Films
100%
Tetraethyl Orthosilicate
42%
Refractive Index
28%
Lamp
14%
X-Ray Photoelectron Spectroscopy
14%