Abstract
SnS van der Waals epitaxies (vdWEs) were grown by molecular beam epitaxy (MBE) on layered substrates such as graphene and mica. Photo-absorption measurements indicate an indirect bandgap of ∼1 eV and a direct bandgap of ∼1.25 eV. The technique leads to significant improvement in the crystallinity of the films compared to the samples deposited on convention crystalline semiconductors or soda lime glass. The absorption coefficient, α, is of the order of 104 cm-1 with sharp cutoff in energy indicating low concentration of bandgap states. Hole mobility of ∼81 cm2V-1s-1 was observed for SnS films on graphene/GaAs(100) substrates.
Original language | English |
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Title of host publication | 2012 IEEE International Conference on Electron Devices and Solid State Circuit, EDSSC 2012 |
DOIs | |
Publication status | Published - 1 Dec 2012 |
Event | 2012 8th IEEE International Conference on Electron Devices and Solid-State Circuits, EDSSC 2012 - Bangkok, Thailand Duration: 3 Dec 2012 → 5 Dec 2012 |
Conference
Conference | 2012 8th IEEE International Conference on Electron Devices and Solid-State Circuits, EDSSC 2012 |
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Country/Territory | Thailand |
City | Bangkok |
Period | 3/12/12 → 5/12/12 |
Keywords
- molecular beam epitaxy
- photovoltaics
- SnS
- van der Waals Epitaxy
ASJC Scopus subject areas
- Hardware and Architecture
- Electrical and Electronic Engineering