Growth and structural study of nanocrystalline titanium oxide and zirconium oxide thin films deposited at low temperatures

B. K. Tay, Z. W. Zhao, Shu Ping Lau, J. X. Gao

Research output: Journal article publicationJournal articleAcademic researchpeer-review


Titanium oxide and zirconium oxide thin films were deposited at low temperatures (not exceeding 350°C) by off-plane filtered cathodic vacuum arc (FCVA). The film structures were studied by XRD and Raman spectra. For titanium oxide thin films, amorphous structure remains up to 230°C, and anatase film with the crystallite size of 16 nm is observed at 330°C as confirmed by XRD and Raman analysis. For zirconium oxide, the film structure develops from amorphous at room temperature to polycrystalline state at 150°C and above. Moreover, for the crystallized films, preferred orientation is along [-111] direction. At 150°C the films possess nano-sized crystallites (less than 15 nm). For these two kinds of metal oxide thin films, surface roughness both increases with the growth temperature.
Original languageEnglish
Pages (from-to)795-801
Number of pages7
JournalInternational Journal of Nanoscience
Issue number4
Publication statusPublished - 1 Aug 2005
Externally publishedYes


  • Raman
  • Titanium oxide
  • XRD
  • Zirconium oxide

ASJC Scopus subject areas

  • Biotechnology
  • Bioengineering
  • Materials Science(all)
  • Condensed Matter Physics
  • Computer Science Applications
  • Electrical and Electronic Engineering

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