Growth and optical properties of (KNa)0.1(Sr0.61Ba0.39)0.9Nb2O6thin films by pulsed laser deposition

Yueli Zhang; Keyu Tao; Ying Ma; Shenghong Yang; Biao Wang; Chee Leung Mak; Kin Hung Wong

doi:10.1143/JJAP.46.1063

Growth and optical properties of (KNa)_0.1(Sr_0.61Ba_0.39)_0.9Nb₂O₆thin films by pulsed laser deposition

Yueli Zhang, Keyu Tao, Ying Ma, Shenghong Yang, Biao Wang, Chee Leung Mak, Kin Hung Wong

Research output: Journal article publication › Journal article › Academic research › peer-review

1 Citation (Scopus)

Abstract

Epitaxial (KNa)0.1Sr0.61Ba0.39)0.9Nb2O6(KNSBN:61) thin films deposited on MgO(100) substrates have been prepared by pulsed laser deposition (PLD). The structural properties of the thin films have been examined by X-ray diffraction analysis. An X-ray diffraction 20 scan indicates single crystalline layers with the (001) orientation perpendicular to the substrate plane. The optical transmission spectra of the thin films have been obtained in the spectral range of 200-900nm, and their optical constants (refractive index n and extinction coefficient k) have been determined. It has been found that the refractive index of the thin films is similar to that of a KNSBN:61 single bulk crystal. The birefringent shift as a function of the applied voltage of the thin films on fused silica has been measured, and the quadratic electro optic coefficient R has been derived to be 0.4 × 10-16(m/V)2at 6328 A.

Original language	English
Pages (from-to)	1063-1066
Number of pages	4
Journal	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume	46
Issue number	3 A
DOIs	https://doi.org/10.1143/JJAP.46.1063
Publication status	Published - 8 Mar 2007

Keywords

KNSBN
Optical constants
PLU

ASJC Scopus subject areas

General Engineering
General Physics and Astronomy

More information

10.1143/JJAP.46.1063

Cite this

@article{245b4e43d96846f4a992d15973d7a43b,

title = "Growth and optical properties of (KNa)0.1(Sr0.61Ba0.39)0.9Nb2O6thin films by pulsed laser deposition",

abstract = "Epitaxial (KNa)0.1Sr0.61Ba0.39)0.9Nb2O6(KNSBN:61) thin films deposited on MgO(100) substrates have been prepared by pulsed laser deposition (PLD). The structural properties of the thin films have been examined by X-ray diffraction analysis. An X-ray diffraction 20 scan indicates single crystalline layers with the (001) orientation perpendicular to the substrate plane. The optical transmission spectra of the thin films have been obtained in the spectral range of 200-900nm, and their optical constants (refractive index n and extinction coefficient k) have been determined. It has been found that the refractive index of the thin films is similar to that of a KNSBN:61 single bulk crystal. The birefringent shift as a function of the applied voltage of the thin films on fused silica has been measured, and the quadratic electro optic coefficient R has been derived to be 0.4 × 10-16(m/V)2at 6328 A.",

keywords = "KNSBN, Optical constants, PLU",

author = "Yueli Zhang and Keyu Tao and Ying Ma and Shenghong Yang and Biao Wang and Mak, {Chee Leung} and Wong, {Kin Hung}",

year = "2007",

month = mar,

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doi = "10.1143/JJAP.46.1063",

language = "English",

volume = "46",

pages = "1063--1066",

journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers",

issn = "0021-4922",

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Growth and optical properties of (KNa)_0.1(Sr_0.61Ba_0.39)_0.9Nb₂O₆thin films by pulsed laser deposition. / Zhang, Yueli; Tao, Keyu; Ma, Ying et al.
In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 46, No. 3 A, 08.03.2007, p. 1063-1066.

Research output: Journal article publication › Journal article › Academic research › peer-review

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AU - Zhang, Yueli

AU - Tao, Keyu

AU - Ma, Ying

AU - Yang, Shenghong

AU - Wang, Biao

AU - Mak, Chee Leung

AU - Wong, Kin Hung

PY - 2007/3/8

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N2 - Epitaxial (KNa)0.1Sr0.61Ba0.39)0.9Nb2O6(KNSBN:61) thin films deposited on MgO(100) substrates have been prepared by pulsed laser deposition (PLD). The structural properties of the thin films have been examined by X-ray diffraction analysis. An X-ray diffraction 20 scan indicates single crystalline layers with the (001) orientation perpendicular to the substrate plane. The optical transmission spectra of the thin films have been obtained in the spectral range of 200-900nm, and their optical constants (refractive index n and extinction coefficient k) have been determined. It has been found that the refractive index of the thin films is similar to that of a KNSBN:61 single bulk crystal. The birefringent shift as a function of the applied voltage of the thin films on fused silica has been measured, and the quadratic electro optic coefficient R has been derived to be 0.4 × 10-16(m/V)2at 6328 A.

AB - Epitaxial (KNa)0.1Sr0.61Ba0.39)0.9Nb2O6(KNSBN:61) thin films deposited on MgO(100) substrates have been prepared by pulsed laser deposition (PLD). The structural properties of the thin films have been examined by X-ray diffraction analysis. An X-ray diffraction 20 scan indicates single crystalline layers with the (001) orientation perpendicular to the substrate plane. The optical transmission spectra of the thin films have been obtained in the spectral range of 200-900nm, and their optical constants (refractive index n and extinction coefficient k) have been determined. It has been found that the refractive index of the thin films is similar to that of a KNSBN:61 single bulk crystal. The birefringent shift as a function of the applied voltage of the thin films on fused silica has been measured, and the quadratic electro optic coefficient R has been derived to be 0.4 × 10-16(m/V)2at 6328 A.

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