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Gait Recognition with Mask-based Regularization

Research output: Chapter in book / Conference proceedingConference article published in proceeding or bookAcademic researchpeer-review

Abstract

Most gait recognition methods exploit spatial-temporal representations from static appearances and dynamic walking patterns. However, we observe that many part-based methods neglect representations at boundaries. In addition, the phenomenon of overfitting on training data is relatively common in gait recognition, which is perhaps due to insufficient data and low-informative gait silhouettes. Motivated by these observations, we propose a novel mask-based regularization method named ReverseMask. By injecting perturbation on the feature map, the proposed regularization method helps convolutional architecture learn the discriminative representations and enhances generalization. Also, we design an Inception-like ReverseMask Block, which has three branches composed of a global branch, a feature-dropping branch, and a feature scaling branch. Precisely, the dropping branch can extract fine-grained representations when partial activations are zero-outed. Meanwhile, the scaling branch randomly scales the feature map, keeping structural information of activations and preventing overfitting. The plug-and-play Inception-like ReverseMask block is simple and effective, improving the performance of many state-of-the-art methods. Extensive experiments demonstrate that the ReverseMask regularization help baseline achieves higher accuracy and better generalization. Moreover, the base-line with Inception-like Block significantly outperforms state-of-the-art methods on the two most popular datasets, CASIA-B and OUMVLP.

Original languageEnglish
Title of host publication2023 IEEE International Joint Conference on Biometrics, IJCB 2023
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pagese-copy
Number of pages10
ISBN (Electronic)9798350337266
DOIs
Publication statusPublished - Sept 2023
Event2023 IEEE International Joint Conference on Biometrics, IJCB 2023 - Ljubljana, Slovenia
Duration: 25 Sept 202328 Sept 2023

Publication series

Name2023 IEEE International Joint Conference on Biometrics, IJCB 2023

Conference

Conference2023 IEEE International Joint Conference on Biometrics, IJCB 2023
Country/TerritorySlovenia
CityLjubljana
Period25/09/2328/09/23

ASJC Scopus subject areas

  • Computer Vision and Pattern Recognition
  • Biomedical Engineering
  • Modelling and Simulation
  • Instrumentation

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