Keyphrases
Gallium Arsenide
100%
Gate Dielectric Layer
100%
Passivation Layer
100%
Metal-oxide-semiconductor Capacitor (MOSCAP)
100%
Oxynitride
100%
Interfacial Passivation Layer
100%
Gate Dielectric
75%
Electrical Properties
50%
GaAs Surface
50%
Annealing
25%
Oxides
25%
Interfacial Properties
25%
Capacitors
25%
Frequency Dispersion
25%
Al Incorporation
25%
Gate Leakage Current
25%
Flat-band Voltage
25%
Leakage Current Density
25%
Interface State Density
25%
Electrical Reliability
25%
Oxide Semiconductor
25%
Hygroscopicity
25%
Negligible Hysteresis
25%
Suppressed Growth
25%
Small Frequency
25%
In-diffusion
25%
AlON
25%
Material Science
Capacitor
100%
Gallium Arsenide
100%
Metal Oxide
100%
Oxide Semiconductor
100%
Oxynitride
100%
Dielectric Material
100%
Surface (Surface Science)
50%
Density
50%
Annealing
25%
Wettability
25%
Interface Property
25%
Aluminum Oxynitride
25%
Oxide Compound
25%
Engineering
Passivation Layer
100%
Gate Dielectric
100%
Dielectric Layer
100%
Gallium Arsenide
100%
Metal Oxide Semiconductor
100%
Experimental Result
20%
Frequency Dispersion
20%
Oxide Semiconductor
20%
Interface State
20%