Formation of silicon nanopores and nanopillars by a maskless deep reactive ion etching process

Zhiyong Xiao, Chunhua Feng, Philip Ching Ho Chan, I. Ming Hsing

Research output: Chapter in book / Conference proceedingConference article published in proceeding or bookAcademic researchpeer-review

1 Citation (Scopus)

Abstract

This paper presents a maskless process to create silicon nanopores and nanopillars by inductively coupled plasma deep reactive ion etching (ICP DRIE). Preliminary controllability on densities of pores and pillars as well as dimensions of pillars was demonstrated. The pore generating process was also used to create porous polysilicon films for surface micromachining applications. A buried channel was successfully released using the porous polysilicon film fabricated by this method. Nanopillar technology was applied to micro fuel cells to significantly increase the active surface area of silicon-based electrodes.
Original languageEnglish
Title of host publicationTRANSDUCERS and EUROSENSORS '07 - 4th International Conference on Solid-State Sensors, Actuators and Microsystems
Pages89-92
Number of pages4
DOIs
Publication statusPublished - 1 Dec 2007
Externally publishedYes
Event4th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS and EUROSENSORS '07 - Lyon, France
Duration: 10 Jun 200714 Jun 2007

Conference

Conference4th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS and EUROSENSORS '07
Country/TerritoryFrance
CityLyon
Period10/06/0714/06/07

Keywords

  • Makless DRIE porous polysilicon nano

ASJC Scopus subject areas

  • Control and Systems Engineering
  • Electrical and Electronic Engineering

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