Formation of silicon nanopores and nanopillars by a maskless deep reactive ion etching process

Zhiyong Xiao; Chunhua Feng; Philip Ching Ho Chan; I. Ming Hsing

doi:10.1109/SENSOR.2007.4300078

Formation of silicon nanopores and nanopillars by a maskless deep reactive ion etching process

Zhiyong Xiao, Chunhua Feng, Philip Ching Ho Chan, I. Ming Hsing

Research output: Chapter in book / Conference proceeding › Conference article published in proceeding or book › Academic research › peer-review

1 Citation (Scopus)

Abstract

This paper presents a maskless process to create silicon nanopores and nanopillars by inductively coupled plasma deep reactive ion etching (ICP DRIE). Preliminary controllability on densities of pores and pillars as well as dimensions of pillars was demonstrated. The pore generating process was also used to create porous polysilicon films for surface micromachining applications. A buried channel was successfully released using the porous polysilicon film fabricated by this method. Nanopillar technology was applied to micro fuel cells to significantly increase the active surface area of silicon-based electrodes.

Original language	English
Title of host publication	TRANSDUCERS and EUROSENSORS '07 - 4th International Conference on Solid-State Sensors, Actuators and Microsystems
Pages	89-92
Number of pages	4
DOIs	https://doi.org/10.1109/SENSOR.2007.4300078
Publication status	Published - 1 Dec 2007
Externally published	Yes
Event	4th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS and EUROSENSORS '07 - Lyon, France Duration: 10 Jun 2007 → 14 Jun 2007

Conference

Conference	4th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS and EUROSENSORS '07
Country/Territory	France
City	Lyon
Period	10/06/07 → 14/06/07

Keywords

Makless DRIE porous polysilicon nano

ASJC Scopus subject areas

Control and Systems Engineering
Electrical and Electronic Engineering

More information

10.1109/SENSOR.2007.4300078

Cite this

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title = "Formation of silicon nanopores and nanopillars by a maskless deep reactive ion etching process",

abstract = "This paper presents a maskless process to create silicon nanopores and nanopillars by inductively coupled plasma deep reactive ion etching (ICP DRIE). Preliminary controllability on densities of pores and pillars as well as dimensions of pillars was demonstrated. The pore generating process was also used to create porous polysilicon films for surface micromachining applications. A buried channel was successfully released using the porous polysilicon film fabricated by this method. Nanopillar technology was applied to micro fuel cells to significantly increase the active surface area of silicon-based electrodes.",

keywords = "Makless DRIE porous polysilicon nano",

author = "Zhiyong Xiao and Chunhua Feng and Chan, {Philip Ching Ho} and Hsing, {I. Ming}",

year = "2007",

month = dec,

day = "1",

doi = "10.1109/SENSOR.2007.4300078",

language = "English",

isbn = "1424408423",

pages = "89--92",

booktitle = "TRANSDUCERS and EUROSENSORS '07 - 4th International Conference on Solid-State Sensors, Actuators and Microsystems",

note = "4th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS and EUROSENSORS '07 ; Conference date: 10-06-2007 Through 14-06-2007",

}

Xiao, Z, Feng, C, Chan, PCH & Hsing, IM 2007, Formation of silicon nanopores and nanopillars by a maskless deep reactive ion etching process. in TRANSDUCERS and EUROSENSORS '07 - 4th International Conference on Solid-State Sensors, Actuators and Microsystems., 4300078, pp. 89-92, 4th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS and EUROSENSORS '07, Lyon, France, 10/06/07. https://doi.org/10.1109/SENSOR.2007.4300078

Formation of silicon nanopores and nanopillars by a maskless deep reactive ion etching process. / Xiao, Zhiyong; Feng, Chunhua; Chan, Philip Ching Ho et al.
TRANSDUCERS and EUROSENSORS '07 - 4th International Conference on Solid-State Sensors, Actuators and Microsystems. 2007. p. 89-92 4300078.

Research output: Chapter in book / Conference proceeding › Conference article published in proceeding or book › Academic research › peer-review

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T1 - Formation of silicon nanopores and nanopillars by a maskless deep reactive ion etching process

AU - Xiao, Zhiyong

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AU - Chan, Philip Ching Ho

AU - Hsing, I. Ming

PY - 2007/12/1

Y1 - 2007/12/1

N2 - This paper presents a maskless process to create silicon nanopores and nanopillars by inductively coupled plasma deep reactive ion etching (ICP DRIE). Preliminary controllability on densities of pores and pillars as well as dimensions of pillars was demonstrated. The pore generating process was also used to create porous polysilicon films for surface micromachining applications. A buried channel was successfully released using the porous polysilicon film fabricated by this method. Nanopillar technology was applied to micro fuel cells to significantly increase the active surface area of silicon-based electrodes.

AB - This paper presents a maskless process to create silicon nanopores and nanopillars by inductively coupled plasma deep reactive ion etching (ICP DRIE). Preliminary controllability on densities of pores and pillars as well as dimensions of pillars was demonstrated. The pore generating process was also used to create porous polysilicon films for surface micromachining applications. A buried channel was successfully released using the porous polysilicon film fabricated by this method. Nanopillar technology was applied to micro fuel cells to significantly increase the active surface area of silicon-based electrodes.

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DO - 10.1109/SENSOR.2007.4300078

M3 - Conference article published in proceeding or book

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SP - 89

EP - 92

BT - TRANSDUCERS and EUROSENSORS '07 - 4th International Conference on Solid-State Sensors, Actuators and Microsystems

T2 - 4th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS and EUROSENSORS '07

Y2 - 10 June 2007 through 14 June 2007

ER -

Formation of silicon nanopores and nanopillars by a maskless deep reactive ion etching process

Abstract

Conference

Keywords

ASJC Scopus subject areas

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