Abstract
This paper presents a maskless process to create silicon nanopores and nanopillars by inductively coupled plasma deep reactive ion etching (ICP DRIE). Preliminary controllability on densities of pores and pillars as well as dimensions of pillars was demonstrated. The pore generating process was also used to create porous polysilicon films for surface micromachining applications. A buried channel was successfully released using the porous polysilicon film fabricated by this method. Nanopillar technology was applied to micro fuel cells to significantly increase the active surface area of silicon-based electrodes.
Original language | English |
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Title of host publication | TRANSDUCERS and EUROSENSORS '07 - 4th International Conference on Solid-State Sensors, Actuators and Microsystems |
Pages | 89-92 |
Number of pages | 4 |
DOIs | |
Publication status | Published - 1 Dec 2007 |
Externally published | Yes |
Event | 4th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS and EUROSENSORS '07 - Lyon, France Duration: 10 Jun 2007 → 14 Jun 2007 |
Conference
Conference | 4th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS and EUROSENSORS '07 |
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Country/Territory | France |
City | Lyon |
Period | 10/06/07 → 14/06/07 |
Keywords
- Makless DRIE porous polysilicon nano
ASJC Scopus subject areas
- Control and Systems Engineering
- Electrical and Electronic Engineering