Formation of cobalt silicide spikes in 0.18 μm complementary metal oxide semiconductor process

Jiyan Dai, Z. R. Guo, S. F. Tee, C. L. Tay, Eddie Er, S. Redkar

Research output: Journal article publicationJournal articleAcademic researchpeer-review

21 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Formation of cobalt silicide spikes in 0.18 μm complementary metal oxide semiconductor process'. Together they form a unique fingerprint.

Keyphrases

Material Science