Formation of carbon nanoclusters by implantation of keV carbon ions in fused silica followed by thermal annealing

P. Olivero, J. L. Peng, A. Liu, P. Reichart, J. C. McCallum, J. Y. Sze, Shu Ping Lau, B. K. Tay, R. Kalish, Sarit Dhar, Leonard Feldman, D. N. Jamieson, S. Prawer

Research output: Journal article publicationConference articleAcademic researchpeer-review


In the last decade, the synthesis and characterization of nanometer sized carbon clusters have attracted growing interest within the scientific community. This is due to both scientific interest in the process of diamond nucleation and growth, and to the promising technological applications in nanoelectronics and quantum communications and computing. Our research group has demonstrated that MeV carbon ion implantation in fused silica followed by thermal annealing in the presence of hydrogen leads to the formation of nanocrystalline diamond, with cluster size ranging from 5 to 40 nm. In the present paper, we report the synthesis of carbon nanoclusters by the implantation into fused silica of keV carbon ions using the Plasma Immersion Ion Implantation (PIII) technique, followed by thermal annealing in forming gas (4%2H in Ar). The present study is aimed at evaluating this implantation technique that has the advantage of allowing high fluence-rates on large substrates. The carbon nanostructures have been characterized with optical absorption and Raman spectroscopies, cross sectional Transmission Electron Microscopy (TEM), and Parallel Electron Energy Loss Spectroscopy (PEELS). Nuclear Reaction Analysis (NRA) has been employed to evaluate the deuterium incorporation during the annealing process, as a key mechanism to stabilize the formation of the clusters.
Original languageEnglish
Article number10
Pages (from-to)35-43
Number of pages9
JournalProceedings of SPIE - The International Society for Optical Engineering
Publication statusPublished - 20 Jun 2005
Externally publishedYes
EventMicro- and Nanotechnology: Materials, Processes, Packaging, and Systems II - Sydney, Australia
Duration: 13 Dec 200415 Dec 2004


  • Carbon nanoclusters
  • keV ion implantation
  • Nuclear Reaction Analysis
  • Plasma ion immersion implantation
  • Raman spectroscopy

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering


Dive into the research topics of 'Formation of carbon nanoclusters by implantation of keV carbon ions in fused silica followed by thermal annealing'. Together they form a unique fingerprint.

Cite this