Skip to main navigation Skip to search Skip to main content

Ferroelectric, piezoelectric, and leakage current properties of (K0.48Na0.48Li0.04)(Nb0.775Ta0.225)O3thin films grown by pulsed laser deposition

  • D. Y. Wang
  • , D. M. Lin
  • , Kin Wing Kwok
  • , N. Y. Chan
  • , Jiyan Dai
  • , S. Li
  • , H. L.W. Chan

Research output: Journal article publicationJournal articleAcademic researchpeer-review

Abstract

Lead-free (K0.48Na0.48Li0.04)(Nb0.775Ta0.225)O3(KNLNT) thin films were deposited on Pt(111)/Ti/SiO2/Si(001) substrates using pulsed laser deposition. The film exhibited a well-defined ferroelectric hysteresis loop with a remnant polarization 2Prof 22.6 μC/cm2and a coercive field Ecof 10.3 kV/mm. The effective piezoelectric coefficient d33, fof the KNLNT thin films was found to be about 49 pm/V by piezoelectric force microscope. The dominant conduction mechanisms of Au/KNLNT/Pt thin film capacitor were determined to be bulk-limited space-charge-limited-current and Poole-Frenkle emission at low and high electric field strengths, respectively, within a measured temperature range of 130-370 K.
Original languageEnglish
Article number022902
JournalApplied Physics Letters
Volume98
Issue number2
DOIs
Publication statusPublished - 10 Jan 2011

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Fingerprint

Dive into the research topics of 'Ferroelectric, piezoelectric, and leakage current properties of (K0.48Na0.48Li0.04)(Nb0.775Ta0.225)O3thin films grown by pulsed laser deposition'. Together they form a unique fingerprint.

Cite this