Fabrication of silica-on-silicon waveguide devices by PECVD

S. F. Lin, J. P. Hou, C. H. Chiu, J. Y. Lin, T. C. Chu, D. P. Tsai, A. K. Chu

Research output: Journal article publicationConference articleAcademic researchpeer-review

Abstract

Planar lightwave circuits (PLC) utilizing glass related waveguide technologies are nowadays crucial components in optical communication system. In this paper, we present a standardized, silicon dioxide (SiO2) based waveguide structure prepared by plasma enhanced chemical vapor deposition (PECVD) for applications in telecommunication devices, such as wide-band optical power splitter. The index of waveguide layer can be controlled by the N2O:SiH4 ratio and process parameter. High density inductively coupled plasma (ICP) etching system was used to define the waveguide pattern. The fabricated waveguides show satisfactory optical characteristics including low waveguide loss, low chip-to-fiber coupling loss (< 0.5 dB/facet), and low polarization dependence loss (< 0.2 dB).

Original languageEnglish
Pages (from-to)338-344
Number of pages7
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume4904
DOIs
Publication statusPublished - Oct 2002
Externally publishedYes
EventOptical Fiber and Planar Waveguide Technology II - Shanghai, China
Duration: 16 Oct 200218 Oct 2002

Keywords

  • ICP
  • PECVD
  • Planar lightwave circuits (PLC)
  • Silica
  • Waveguide
  • Waveguide loss

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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