Fabrication of silica-on-silicon waveguide devices by PECVD

S. F. Lin; J. P. Hou; C. H. Chiu; J. Y. Lin; T. C. Chu; D. P. Tsai; A. K. Chu

doi:10.1117/12.481243

Fabrication of silica-on-silicon waveguide devices by PECVD

S. F. Lin, J. P. Hou, C. H. Chiu, J. Y. Lin, T. C. Chu, D. P. Tsai, A. K. Chu

Research output: Journal article publication › Conference article › Academic research › peer-review

1 Citation (Scopus)

Abstract

Planar lightwave circuits (PLC) utilizing glass related waveguide technologies are nowadays crucial components in optical communication system. In this paper, we present a standardized, silicon dioxide (SiO₂) based waveguide structure prepared by plasma enhanced chemical vapor deposition (PECVD) for applications in telecommunication devices, such as wide-band optical power splitter. The index of waveguide layer can be controlled by the N₂O:SiH₄ ratio and process parameter. High density inductively coupled plasma (ICP) etching system was used to define the waveguide pattern. The fabricated waveguides show satisfactory optical characteristics including low waveguide loss, low chip-to-fiber coupling loss (< 0.5 dB/facet), and low polarization dependence loss (< 0.2 dB).

Original language	English
Pages (from-to)	338-344
Number of pages	7
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	4904
DOIs	https://doi.org/10.1117/12.481243
Publication status	Published - Oct 2002
Externally published	Yes
Event	Optical Fiber and Planar Waveguide Technology II - Shanghai, China Duration: 16 Oct 2002 → 18 Oct 2002

Keywords

ICP
PECVD
Planar lightwave circuits (PLC)
Silica
Waveguide
Waveguide loss

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

More information

10.1117/12.481243

Cite this

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title = "Fabrication of silica-on-silicon waveguide devices by PECVD",

abstract = "Planar lightwave circuits (PLC) utilizing glass related waveguide technologies are nowadays crucial components in optical communication system. In this paper, we present a standardized, silicon dioxide (SiO2) based waveguide structure prepared by plasma enhanced chemical vapor deposition (PECVD) for applications in telecommunication devices, such as wide-band optical power splitter. The index of waveguide layer can be controlled by the N2O:SiH4 ratio and process parameter. High density inductively coupled plasma (ICP) etching system was used to define the waveguide pattern. The fabricated waveguides show satisfactory optical characteristics including low waveguide loss, low chip-to-fiber coupling loss (< 0.5 dB/facet), and low polarization dependence loss (< 0.2 dB).",

keywords = "ICP, PECVD, Planar lightwave circuits (PLC), Silica, Waveguide, Waveguide loss",

author = "Lin, {S. F.} and Hou, {J. P.} and Chiu, {C. H.} and Lin, {J. Y.} and Chu, {T. C.} and Tsai, {D. P.} and Chu, {A. K.}",

year = "2002",

month = oct,

doi = "10.1117/12.481243",

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volume = "4904",

pages = "338--344",

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AU - Lin, S. F.

AU - Hou, J. P.

AU - Chiu, C. H.

AU - Lin, J. Y.

AU - Chu, T. C.

AU - Tsai, D. P.

AU - Chu, A. K.

PY - 2002/10

Y1 - 2002/10

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AB - Planar lightwave circuits (PLC) utilizing glass related waveguide technologies are nowadays crucial components in optical communication system. In this paper, we present a standardized, silicon dioxide (SiO2) based waveguide structure prepared by plasma enhanced chemical vapor deposition (PECVD) for applications in telecommunication devices, such as wide-band optical power splitter. The index of waveguide layer can be controlled by the N2O:SiH4 ratio and process parameter. High density inductively coupled plasma (ICP) etching system was used to define the waveguide pattern. The fabricated waveguides show satisfactory optical characteristics including low waveguide loss, low chip-to-fiber coupling loss (< 0.5 dB/facet), and low polarization dependence loss (< 0.2 dB).

KW - ICP

KW - PECVD

KW - Planar lightwave circuits (PLC)

KW - Silica

KW - Waveguide

KW - Waveguide loss

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DO - 10.1117/12.481243

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VL - 4904

SP - 338

EP - 344

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

T2 - Optical Fiber and Planar Waveguide Technology II

Y2 - 16 October 2002 through 18 October 2002

ER -

Fabrication of silica-on-silicon waveguide devices by PECVD

Abstract

Keywords

ASJC Scopus subject areas

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