Fabrication of nano-scaled patterns on ceramic thin films and silicon substrates by soft ultraviolet nanoimprint lithography

K. L. Jim, F. K. Lee, J. Z. Xin, Chi Wah Leung, H. L W Chan, Y. Chen

Research output: Journal article publicationJournal articleAcademic researchpeer-review

15 Citations (Scopus)


Soft ultraviolet nanoimprint lithography is a cost-effective and versatile technique for the transfer of nano-scaled patterns to various surfaces. Here, we report on the fabrication of sub-micron square pillar arrays in epitaxial Ba0.7Sr0.3TiO3 ceramic films, using a combination of nanoimprint lithography and inductively coupled plasma etching techniques. Based on a similar approach we have also succeeded in preparing positive (direct) and negative (inverse) replicas of silicon master molds. Such a generic process could find application in various materials.
Original languageEnglish
Pages (from-to)959-962
Number of pages4
JournalMicroelectronic Engineering
Issue number5-8
Publication statusPublished - 1 May 2010


  • Ferroelectric materials
  • Nanoimprint lithography
  • Photonic crystals

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics

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