Abstract
Soft ultraviolet nanoimprint lithography is a cost-effective and versatile technique for the transfer of nano-scaled patterns to various surfaces. Here, we report on the fabrication of sub-micron square pillar arrays in epitaxial Ba0.7Sr0.3TiO3 ceramic films, using a combination of nanoimprint lithography and inductively coupled plasma etching techniques. Based on a similar approach we have also succeeded in preparing positive (direct) and negative (inverse) replicas of silicon master molds. Such a generic process could find application in various materials.
Original language | English |
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Pages (from-to) | 959-962 |
Number of pages | 4 |
Journal | Microelectronic Engineering |
Volume | 87 |
Issue number | 5-8 |
DOIs | |
Publication status | Published - 1 May 2010 |
Keywords
- Ferroelectric materials
- Nanoimprint lithography
- Photonic crystals
ASJC Scopus subject areas
- Electrical and Electronic Engineering
- Electronic, Optical and Magnetic Materials
- Surfaces, Coatings and Films
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics