Fabrication and characterization of horizontally aligned carbon nanotubes for interconnect application

Yang Chai, Zhiyong Xiao, Philip Ching Ho Chan

Research output: Chapter in book / Conference proceedingConference article published in proceeding or bookAcademic researchpeer-review

4 Citations (Scopus)

Abstract

We discuss the use of electron-shading effect during the plasma-enhanced chemical vapor deposition to control the growth of carbon nanotubes (CNTs). We designed and fabricated the trench and island test structures. The horizontally aligned CNTs were grown from the sidewall of the polysilicon structure, parallel to the silicon oxide surface. We investigated the electrical property of the CNT number for the interconnect line application. We also studied the scaling effect of the CNT number. This approach provides a method to implement complex CNT structure by in-stiu growth, and integrate them to realize various electricaldevices and interconnect lines.
Original languageEnglish
Title of host publication2009 Proceedings 59th Electronic Components and Technology Conference, ECTC 2009
Pages1465-1469
Number of pages5
DOIs
Publication statusPublished - 12 Oct 2009
Externally publishedYes
Event2009 59th Electronic Components and Technology Conference, ECTC 2009 - San Diego, CA, United States
Duration: 26 May 200929 May 2009

Conference

Conference2009 59th Electronic Components and Technology Conference, ECTC 2009
Country/TerritoryUnited States
CitySan Diego, CA
Period26/05/0929/05/09

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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