Epitaxial growth and planar dielectric properties of compositionally graded (Ba_1-xSr_x)TiO₃thin films prepared by pulsed-laser deposition

Keyphrases

• Pulsed Laser Deposition 100%
• Dielectric Properties 100%
• Epitaxial Growth 100%
• TiO3 100%
• Compositionally Graded 100%
• Dielectric Response 60%
• Epitaxial 40%
• Graded Film 40%
• Low Temperature 20%
• Room Temperature 20%
• Strain Gradient 20%
• Capacitance 20%
• Rutherford Backscattering Spectrometry 20%
• Film Capacitor 20%
• Dielectric Constant 20%
• Dielectric Loss 20%
• Bias Voltage 20%
• Temperature Effect 20%
• Capacitors 20%
• Tunability 20%
• Applied Voltage 20%
• MgO Substrate 20%
• Hysteresis 20%
• Applied Electric Field 20%
• DC Bias 20%
• Broad Temperature 20%
• Residual Strain 20%
• Graded Structure 20%
• Dielectric Thin Films 20%
• Diffuse Phase Transition 20%
• Temperature Regime 20%
• Compositional Gradient 20%
• Interdigital Electrodes 20%
• Flat Profile 20%

Material Science

• Epitaxy 100%
• Dielectric Property 100%
• Pulsed Laser Deposition 100%
• Film 100%
• Dielectric Material 71%
• Capacitor 28%
• Thin Films 28%
• Capacitance 14%
• Permittivity 14%
• Surface (Surface Science) 14%
• Magnesium Oxide 14%